High Temperature Lab CVD vacuum tube Furnace for Oxford

HT High Temperature Lab CVD vacuum tube Furnace offers custom cost effective furnace for Chemical vapor infiltration, chemical vapor deposition, graphite purification, graphitization, purification and heat treatment, the PECVD vacuum tube furnace is working temperature from 300℃ to 1600℃. With a vacuum pump, gas mixing, our CVD tube furnace adopts an advanced temperature control system, high temperature accuracy, excellent gas flow accuracy, easy operation, excellent heat-insulation effect, symmetrical temperature uniformity. Mainly used for labs of the university, research center, and production enterprise, etc.

HTTF1200 laboratory vacuum tube furnace series Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) multi-zone split tube furnaces feature the famous Kanthal® (Sweden) wire heating elements embedded in high quality alumina fiber insulation. All steel dual-layer housing ensures durability and helps minimize heat loss to exterior surface.

The CVD Tube Furnace operation is controlled by 30-segment digital controller with built-in RS485 digital communications port and USB adaptor, allowing the user to connect to a PC for remote control and monitoring of the lab furnace. You can also save or export test results.

In 2011 years, HT CVD vacuum tube furnace systems have been successfully to university of Oxford.