HTCGF-2000 Crystal Growth Furnace system is designing and developing a special CZ crystal grower from vacuum levitation melting up to 2000ºC. The Crystal Growth system includes a high-frequency induction heating supply, high vacuum chamber, water cold copper crucible for levitation melting and precision pulling mechanism.
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HTCGF-2000 Crystal Growth Furnace system is designing and developing a special CZ crystal grower from vacuum levitation melting up to 2000ºC. The Crystal Growth system includes a high-frequency induction heating supply, high vacuum chamber, water cold copper crucible for levitation melting and precision pulling mechanism. Levitation melting avoids the contamination of the sample from the crucible and may produce high purity crystal for metallic alloys
Structure of Grower | 40KW RF Induction power source for levitation melting Special designed water-cooled copper crucible for 60 g max. metal melt levitation. Vacuum Chamber which can reach q10-6 torr by a turbopump system Precision pulling system with a rotary rod with speed 0.1 mm/h - 24 mm/h |
RF Induction Power Source | Input power： 40KW Max. Frequency ： 80-200KHz Current： 10-100A Input Voltage: 200V +/-10%, Three-phase, 50/60Hz Water Cooling ：Pressure ≧0.2MPa Water flow: ≧10L/min |
Water Cold Copper Crucible | Crucible size: ID 35mm, Depth: 60mm Melting Capability: 60g Max. Water flow requied： 58L/min |
Pulling Mechanism | Pulling Speed: 0.1-24mm/h Pulling Rod Rotation Speed： 0.03-50r/min Pulling travel distance: 250 mm Faster travel: Manual operation Optional: Water cold pulling rod is available upon request at extra cost. |
Vacuum Chamber | Made of SS 304 with water cooling jacket Vacuum Chamber size: Φ400x 40 D mm Quartz Widow: Φ300mm Two KF-25 port for gas inlet and outlet Vacuum Level: 10-6 Torr by turbopump Vacuum Pump: high-speed turbopump with 700L/S |
Water Cooling | > 110 L/Minute at 30 C recirculating water flow is required The water chiller is not included. please click picture left to order |
Warranty | One Year limited warranty and lifetime technical support |
HT crystal growth furnace is providing the two most important parameters necessary for critical growth: stability and control. Both are necessary to achieve consistency, repeatability, and uniformity – the keys to successful crystal growth in the laboratory and in production.
HTCGF-2000 Crystal Growth Furnace system is designing and developing a special CZ crystal grower from vacuum levitation melting up to 2000ºC. The Crystal Growth system includes a high-frequency induction heating supply, high vacuum chamber, water cold copper crucible for levitation melting and precision pulling mechanism. Levitation melting avoids the contamination of the sample from the crucible and may produce high purity crystal for metallic alloys
Structure of Grower | 40KW RF Induction power source for levitation melting Special designed water-cooled copper crucible for 60 g max. metal melt levitation. Vacuum Chamber which can reach q10-6 torr by a turbopump system Precision pulling system with a rotary rod with speed 0.1 mm/h - 24 mm/h |
RF Induction Power Source | Input power： 40KW Max. Frequency ： 80-200KHz Current： 10-100A Input Voltage: 200V +/-10%, Three-phase, 50/60Hz Water Cooling ：Pressure ≧0.2MPa Water flow: ≧10L/min |
Water Cold Copper Crucible | Crucible size: ID 35mm, Depth: 60mm Melting Capability: 60g Max. Water flow requied： 58L/min |
Pulling Mechanism | Pulling Speed: 0.1-24mm/h Pulling Rod Rotation Speed： 0.03-50r/min Pulling travel distance: 250 mm Faster travel: Manual operation Optional: Water cold pulling rod is available upon request at extra cost. |
Vacuum Chamber | Made of SS 304 with water cooling jacket Vacuum Chamber size: Φ400x 40 D mm Quartz Widow: Φ300mm Two KF-25 port for gas inlet and outlet Vacuum Level: 10-6 Torr by turbopump Vacuum Pump: high-speed turbopump with 700L/S |
Water Cooling | > 110 L/Minute at 30 C recirculating water flow is required The water chiller is not included. please click picture left to order |
Warranty | One Year limited warranty and lifetime technical support |
HT crystal growth furnace is providing the two most important parameters necessary for critical growth: stability and control. Both are necessary to achieve consistency, repeatability, and uniformity – the keys to successful crystal growth in the laboratory and in production.
